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Resist remover Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Resist remover Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Hayashi Pure Chemical Ind., Ltd. Electronic Materials Osaka//Chemical
  2. KANTO CHEMICAL CO., INC. Electronics Material Division Tokyo//Chemical
  3. 山縣機械 ＦＴＰ事業部 Osaka//Industrial Machinery
  4. 4 三若純薬研究所 Aichi//Chemical
  5. 4 ラットコーポレーション 本社：営業部・業務部 Aichi//Trading company/Wholesale
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Resist remover Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Release agent remover (water-based) "PureClean MC series" Hayashi Pure Chemical Ind., Ltd. Electronic Materials
  2. NMP Substitute Release Agent "JELK-404" KANTO CHEMICAL CO., INC. Electronics Material Division
  3. Resist stripping solution (amine/solvent-based, solvent-based, organic alkaline-based) Hayashi Pure Chemical Ind., Ltd. Electronic Materials
  4. 4 Release agent "PURMS＋Y" 山縣機械 ＦＴＰ事業部
  5. 5 Resist stripping solution ラットコーポレーション 本社：営業部・業務部

Resist remover Product List

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Resist stripping solution (amine/solvent-based, solvent-based, organic alkaline-based)

Resist stripping solution (amine/solvent-based, solvent-based, organic alkaline-based)

We have a range of stripping solutions, including those mixed with amines and solvents, solvent-based stripping solutions, and organic alkaline stripping solutions.

The features of this product are as follows: - It effectively removes resist without corroding metal or insulating films. - It can be processed at both low and high temperatures. - All resist stripping solutions are free of NMP. Keywords: resist, non-aqueous

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Release agent remover (water-based) "PureClean MC series"

Release agent remover (water-based) "PureClean MC series"

The release of the resist is good. The water-based release agent does not fall under hazardous materials according to fire safety regulations.

The features of this product are as follows: - It effectively removes resist without corroding metal or insulating films. - It allows for processing at low temperatures and for short durations. - It does not use NMP. Keywords: resist, non-hazardous material

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Resist stripping solution

Resist stripping solution

Ethylene carbonate-based resist stripping solution

The ethylene carbonate-based "resist stripping solution" is made from carbon dioxide as a raw material, resulting in almost no carbon dioxide emissions during production. Compared to ethylene carbonate, the solid substance has been improved to 19°C at room temperature. It can be used as a liquid in clean rooms. Its main applications include polycarbonate raw materials and electrolyte for lithium-ion batteries. 【Features】 ■ Low vapor pressure and almost no odor ■ High flash point, reducing the risk of fire ■ Almost no CO2 emissions during raw material production For more details, please refer to the catalog or feel free to contact us.

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Release agent "PURMS＋Y"

Release agent "PURMS＋Y"

Zero emission compatible release agent (neutral type)!

"PURMS+Y" is a neutral type of resist stripping solution that makes it easy to recover stripping pieces with a filter, as the dry film resist does not dissolve. The liquid has a long life, which can reduce maintenance time. Additionally, it can be reused, enabling a zero-emission process. 【Features】 - Rinse wastewater can be treated biologically - Low vapor pressure and weak hygroscopicity result in high recovery rates of the processing solution - Does not damage the underlying metal, etc. *For more details, please download the PDF or feel free to contact us.

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NMP Substitute Release Agent "JELK-404"

NMP Substitute Release Agent "JELK-404"

NMP-free and amine-free resist stripping solution with high selectivity for Al and Cu wiring. NMP-free and amine-free resist stripping solution, offering high selectivity for Al and Cu wiring.

NMP is a substance of concern due to its reproductive toxicity, and considering the potential health hazards to workers and adverse environmental impacts, it has been designated as a restricted substance under REACH regulations, and a risk management rule proposal has been published under TSCA, leading to stricter regulations regarding its use. In response to these regulations, we offer a resist stripping solution compatible with ultrasonic processes that can be used as an alternative to NMP. 【Features】 ■ Does not contain coating-forming corrosion inhibitors and has corrosion resistance for wiring materials such as Cu and Al. ■ Free of NMP and amines ■ Compatible with ultrasonic processes *For more details, please visit our website or request materials, or view the PDF data available for download.

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Photoresist stripping solution "Unrust RW-C"

Photoresist stripping solution "Unrust RW-C"

Compatible with immersion and spray methods! Introducing a mixture of caustic alkali and high-boiling solvents.

"Unrust RW-C" is a photoresist stripping solution that offers strong peeling and cleaning properties for resins, compatible with both immersion and spray methods. It is suitable for the regeneration and cleaning of glass substrates and for the stripping of resin resist. It is a mixture of caustic alkali and high-boiling solvents. 【Processing Conditions】 ■ Concentration: Undiluted treatment ■ Temperature: 50–70°C ■ Time: Approximately 5 minutes *For more details, please refer to the PDF document or feel free to contact us.

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Release agent "Unrust M10"

Release agent "Unrust M10"

Compatible with immersion and spray methods! Prevents poor resist peeling due to snagging on the substrate!

"Unrust M10" is a resist stripping solution that can be used with both immersion and spray methods. It is available in 20kg cans, drums, 1-ton containers, and tankers. Since the stripping pieces are small, it can prevent resist stripping failures caused by snagging on the substrate. 【Processing Conditions】 ■ Concentration: Use as is or diluted with pure water ■ Temperature: Room temperature to 70℃ ■ Time: 20 to 90 seconds *For more details, please refer to the PDF document or feel free to contact us.

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Photoresist stripping solution "Unrust M601"

Photoresist stripping solution "Unrust M601"

Compatible with immersion and spray methods! High permeability allows for detachment down to the details!

"Unrust M601" is a photoresist stripping solution of the organic alkaline type that can also be used on aluminum substrates. It is available in 20kg cans/drums. Due to its high permeability, it can strip down to fine details. It is compatible with both immersion and spray methods. 【Processing Conditions】 ■ Concentration: Undiluted ■ Temperature: Room temperature to 70℃ ■ Time: 20 to 90 seconds *For more details, please refer to the PDF document or feel free to contact us.

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Photoresist stripping solution "Unrust TP160"

Photoresist stripping solution "Unrust TP160"

There is a rust prevention and removal effect on iron-based materials! It is highly biodegradable and has low environmental impact.

"Unrust TP160" is a biodegradable and environmentally friendly photoresist stripping solution. By adding it to alkaline-based stripping solutions such as caustic soda, caustic potash, and organic alkalis, the stripping of the resist becomes easier. It has rust prevention and removal effects on iron-based substrates. [Features] - By adding it to alkaline-based stripping solutions such as caustic soda, caustic potash, and organic alkalis, the stripping of the resist becomes easier. - It has rust prevention and removal effects on iron-based substrates. - It is highly biodegradable and has low environmental impact. *For more details, please refer to the PDF document or feel free to contact us.

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Photoresist stripping solution "Unrust RC-D6"

Photoresist stripping solution "Unrust RC-D6"

Can be used for stripping dry film resist and urethane paint, etc.!

"Unlast RC-D6" is a photoresist stripping solution suitable for the removal of resist and paint. It is a solvent-type stripping solution that can be used for stripping dry film resist and urethane paint. Available in 18kg cans/drums. 【Processing Conditions】 ■ Concentration: Undiluted ■ Temperature: Room temperature to 60℃ ■ Time: 5 to 60 minutes *For more details, please refer to the PDF document or feel free to contact us.

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Photoresist stripping solution "Unrust OS15"

Photoresist stripping solution "Unrust OS15"

Introduction of a photoresist stripping solution containing chelating agents, which also has rust removal effects on iron plate surfaces.

"Unrust OS15" is a photoresist stripping solution suitable for the removal of casein-based, PVA-based resists, and dry film resists. Available in 20kg cans/drums/1t containers. It contains chelating agents and also has rust removal properties for metal surfaces. 【Processing Conditions】 ■ Concentration: 3 times diluted to undiluted ■ Temperature: 50–70℃ ■ Time: 2–10 minutes *For more details, please refer to the PDF document or feel free to contact us.

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Release agent "Unrust No.1D"

Release agent "Unrust No.1D"

Water-soluble resist stripping agent! A resist stripping solution compatible with aluminum substrates.

We would like to introduce the rust stripping solution "Unrust No.1D" handled by Sanwaka Junyaku Research Institute Co., Ltd. It is a mixture of high-boiling solvents based on silicates, and it is compatible with aluminum substrates. Available in 20kg cans/drums/tankers. 【Processing Conditions】 ■ Concentration: Diluted with original solution or pure water ■ Temperature: Room temperature to 70℃ ■ Time: 20 to 90 seconds *For more details, please refer to the PDF document or feel free to contact us.

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Release agent "Unrust M6"

Release agent "Unrust M6"

For the peeling application of positive-type resist! Compatible with dipping and spraying methods.

"Unrust M6" is a resist stripping solution of the organic alkaline type that can also be used on aluminum substrates. Available in 20kg cans/drums/tankers. It is suitable for dry films and positive resists, and can be applied using immersion or spray methods. 【Processing Conditions】 ■ Concentration: Diluted with original solution or pure water ■ Temperature: Room temperature to 70℃ ■ Time: 20 to 90 seconds *For more details, please refer to the PDF document or feel free to contact us.

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Release agent "Unrust R510"

Release agent "Unrust R510"

The detached film is relatively small! The BOD and COD loads are also lower compared to others.

"Unrust R510" is a stripping agent for PVA-based photoresists. It has been specifically developed for lead frames. The stripped film is relatively small, and the BOD and COD loads are lower compared to other products. The target material is positive resist, primarily used in the electronics industry. 【Features】 ■ Stripping agent for PVA-based photoresists ■ Specifically developed for lead frames ■ The stripped film is relatively small ■ BOD and COD loads are lower compared to other products ■ Poisonous and hazardous substances control law: Poison *For more details, please refer to the PDF document or feel free to contact us.

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Release agent "Unrust M71-2"

Release agent "Unrust M71-2"

Compatible with immersion and spray methods! It softens the peeling pieces and has the effect of breaking them down.

"Unrust M71-2" is an organic alkaline type resist stripping solution that can also be used on aluminum substrates. It is compatible with both immersion and spray methods. It has the effect of softening and breaking down the stripping pieces. 【Features】 ■ Organic alkaline type ■ Usable on aluminum substrates ■ Compatible with immersion and spray methods ■ Effectively softens and breaks down stripping pieces ■ Poisonous substances control law: Poison *For more details, please refer to the PDF document or feel free to contact us.

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